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Spectroscopic characterization of the plasma generated during the deposition of AlxGa1-xN films by pulsed laser co-ablation of Al and GaAs targets in electron cyclotron resonance nitrogen plasma

发布时间：2024-12-13点击次数：

发表刊物： JOURNAL OF PHYSICS D-APPLIED PHYSICS
编号： SY117119
卷号： 48
期号： 24
是否译文： 否
发表时间： 2015-01-01

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