INFLUENCE OF TRENCH OXIDE ON SCHOTTKY BARRIER HEIGHT FOR TISIX/SI POWER DIODE
- 点击次数:
- 发表刊物:2016 13Th IEEE International Conference on Solid-State and Integrated Circuit Technology(Icsict) Proceedings
- 论文编号:SR3176
- 页面范围:389-391
- 是否译文:否
- 发表时间:2016-01-01
- 发表时间:2016-01-01