论文成果
- Sub-10 nm silicon FinFET devices on SOI substrate made by block copolymer lithography.-2018 14TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY, ICSICT 2018 - PROCEEDINGS-2018-01-01
- Combining double patterning with self-assembled block copolymer lamellae to fabricate 10.5 nm full-pitch line/space patterns.-Nanotechnology-2019-01-01-30
- The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing.-Macromolecules-2018-01-01-51
- Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid.-Soft Matter-2019-01-01-15
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