论文成果
- Sub-10 nm silicon FinFET devices on SOI substrate made by block copolymer lithography
- Combining double patterning with self-assembled block copolymer lamellae to fabricate 10.5 nm full-pitch line/space patterns
- The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing
- Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid
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